LI Cheng-rong 1, WANG Xin-xin 2, ZHAN Hua-mao 1, et al. PLASMA SURFACE TREATMENT AND ATMOSPHERIC PRESSURE GLOW DISCHARGE[J]. High voltageapparatus, 2003, (4): 46-48+51.
LI Cheng-rong 1, WANG Xin-xin 2, ZHAN Hua-mao 1, et al. PLASMA SURFACE TREATMENT AND ATMOSPHERIC PRESSURE GLOW DISCHARGE[J]. High voltageapparatus, 2003, (4): 46-48+51.DOI:
等离子体表面处理与大气压下的辉光放电
摘要
与传统的方法相比
等离子体处理的高效、无毒、节能特性使得它在表面处理和灭菌消毒方面有着很好的应用前景
在上述工业领域
“经典”的大气压放电诸如电晕放电、介质阻挡放电以及电弧放电都不适用。然而
尽管低气压下的辉光放电已得到了很好的发展
大气压下辉光放电的实现还存在一些困难。目前
对大气压下辉光放电物理过程的探索集中在其物理机制、图像捕获以及大气压下空气中辉光放电的实现方面。
Abstract
Compared to traditional methods
the high effi-ciency
innocuity
and energy-saving recommends the plasma processing for surface treatment and sterilization applications.The"classical"atmospheric pressure discharges such as corona discharges
dielectric barrier discharges and arc dis-charges each have drawbacks that make them unsuitable for above applications.However
there are some obstacles in ob-taining atmospheric pressure glow discharge plasmas although the technology of low-pressure glow discharge plasmas has been most highly developed.At present
investigation of physical processes in the atmospheric pressure glow discharge is focusing on the physical mechanism
image capture
and realization of the glow discharges in atmospheric pressure air.