EFFECT OF EXPOSURE ON THE DIELECTRIC BARRIER DISCHARGE PHOTOGRAPHY

WENG Ming  1; CHEN Qisheng  2; WU Rici  3

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EFFECT OF EXPOSURE ON THE DIELECTRIC BARRIER DISCHARGE PHOTOGRAPHY

更新时间：2025-04-26

- EFFECT OF EXPOSURE ON THE DIELECTRIC BARRIER DISCHARGE PHOTOGRAPHY
- High VoltageApparatus Issue 1, Pages: 14-16(2001)
- 作者机构：
  
  1. 西安交通大学,陕西,西安,710049
  2. 广东福地科技股份有限公司,广东,广州,523077
  3. 上海永新彩色显象管有限公司,上海,200237
  4. 西安交通大学!陕西西安710049广东福地科技股份有限公司!广东广州523077上海永新彩色显象管有限公司,上海,200237
- 作者简介：
- 基金信息：
- DOI：
  CLC： TM8
- Published：2001
- 稿件说明：
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[1]翁明,陈启升,吴日赐.曝光量对介质阻挡放电照相的影响[J].高压电器,2001(01):14-16.

WENG Ming 1, CHEN Qisheng 2, WU Rici 3. EFFECT OF EXPOSURE ON THE DIELECTRIC BARRIER DISCHARGE PHOTOGRAPHY[J]. High voltageapparatus, 2001, (1): 14-16.
[1]翁明,陈启升,吴日赐.曝光量对介质阻挡放电照相的影响[J].高压电器,2001(01):14-16. DOI：

WENG Ming 1, CHEN Qisheng 2, WU Rici 3. EFFECT OF EXPOSURE ON THE DIELECTRIC BARRIER DISCHARGE PHOTOGRAPHY[J]. High voltageapparatus, 2001, (1): 14-16. DOI：

摘要

本文叙述了介质阻挡放电照相技术的基本原理

给出了自制的实验装置

并研究了不同曝光时间、不同放电回路电阻对照相质量的影响。在此基础上

提出在采用高压纳秒脉冲放电技术的前提下

综合控制曝光时间和放电回路电阻

是获得良好质量介质阻挡放电像的又一关键

Abstract

In this paper

the basic principle of dielectric barrier discharge photography（DBDP） is discussed. An imaging equipment is set up for the purpose of studying the effect of exposure on the DBDP

by which this influences of exposure time and resistance in discharge circuit on the quality of DBDP are studied

respectively. Based on this results

the author advances that in the premise of using high voltage nanosecond pulse discharge technology

controlling the exposure time and the resistance synthetically is a key for getting a good image of DBDP.

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Related Author

PENG Yan-chang 1

GAO Wei 1

YAN Ping 1

SUN Guang-sheng 1

SHAO Tao 1

YE Qi-zheng

YANG Hai-yan

Related Institution

北京100080

北京 100039

中国科学院研究生院

Graduate School of Chinese Academy of Sciences

Institute of Electrical Engineering, Chinese Academy of Sciences

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