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Activation and Reduction of CH4 and NOx in Different Discharge Plasmas
更新时间:2025-04-26
    • Activation and Reduction of CH4 and NOx in Different Discharge Plasmas

    • High VoltageApparatus   Vol. 46, Issue 7, Pages: 51-56(2010)
    • DOI:10.13296/j.1001-1609.hva.2010.07.002    

      CLC: O539
    • Published:2010

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  • NIU Jin-hai1, ZHANG Zhi-hui2, LIU Dong-ping1. Activation and Reduction of CH4 and NOx in Different Discharge Plasmas[J]. High voltageapparatus, 2010, 46(7): 51-56. DOI: 10.13296/j.1001-1609.hva.2010.07.002.

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