LI Hui, LI Xintao, XU Jianyuan, et al. Streamer Discharge Simulation of SF6/CF4 in Uniform Electrical Field[J]. High voltageapparatus, 2016, 52(12): 122-127.
LI Hui, LI Xintao, XU Jianyuan, et al. Streamer Discharge Simulation of SF6/CF4 in Uniform Electrical Field[J]. High voltageapparatus, 2016, 52(12): 122-127. DOI: 10.13296/j.1001-1609.hva.2016.12.019.
Streamer Discharge Simulation of SF6/CF4 in Uniform Electrical Field
Based on the dynamic characteristics of micro particles in a discharge process
the streamer discharge properties of SF
6
/CF
4
gas mixtures were simulated in uniform electric field. The electron energy distribution functions of SF
6
/CF
4
at different pressures and mixing ratios were obtained by solving two-term Boltzmann equation
which were used to calculate the reduced ionization coefficients and adsorption coefficients. Th
e coefficients were put into a fluid model to simulate the SF
6
/CF
4
streamer discharge process at 0.1 MPa and in a 5 mm gap. The variation of electron number density with time and space were studied. Results show that α/N is increasing with higher E/N at a certain mixing ratio
as well as with higher CF
4
volume fraction at a certain E/N.Electron number density in the streamer head increases rapidly with the development of electron avalanche
and the peak value at 5 ns reaches 9.7 ×10
12
m
-3
. However
the plasma conductive channel is formed when gap is broken down totally
and the electron number density is distributed uniformly with an order of magnitude of 10