PIC/MCC Simulation of Gas Discharge Process in SF<sub>6</sub>/N<sub>2</sub> Gas Mixture

LI Zhuo; PAN Xiang; ZHENG Bei; QIAO Xiangyang; HUANG Kun; LI Siyan

doi:10.13296/j.1001-1609.hva.2016.12.026

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PIC/MCC Simulation of Gas Discharge Process in SF₆/N₂ Gas Mixture

更新时间：2025-04-26

- PIC/MCC Simulation of Gas Discharge Process in SF₆/N₂ Gas Mixture
- High VoltageApparatus Vol. 52, Issue 12, Pages: 164-170(2016)
- 作者机构：
  
  国网安徽省电力公司芜湖供电公司
- 作者简介：
- 基金信息：
- DOI：10.13296/j.1001-1609.hva.2016.12.026
  CLC： TM21
- Published：2016
- 稿件说明：
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[1]李卓,潘翔,郑蓓,乔向阳,黄堃,李思焱.SF_6/N_2混合气体放电过程的PIC/MCC仿真模拟[J].高压电器,2016,52(12):164-170.

LI Zhuo, PAN Xiang, ZHENG Bei, et al. PIC/MCC Simulation of Gas Discharge Process in SF₆/N₂ Gas Mixture[J]. High voltageapparatus, 2016, 52(12): 164-170.
[1]李卓,潘翔,郑蓓,乔向阳,黄堃,李思焱.SF_6/N_2混合气体放电过程的PIC/MCC仿真模拟[J].高压电器,2016,52(12):164-170. DOI： 10.13296/j.1001-1609.hva.2016.12.026.

LI Zhuo, PAN Xiang, ZHENG Bei, et al. PIC/MCC Simulation of Gas Discharge Process in SF₆/N₂ Gas Mixture[J]. High voltageapparatus, 2016, 52(12): 164-170. DOI： 10.13296/j.1001-1609.hva.2016.12.026.

摘要

为了研究SF

混合气体中圆柱形绝缘子的放电过程

采用粒子网格法（PIC法）与蒙特卡罗碰撞模型（MCC模型）相结合的方法（PIC/MCC法）仿真模拟了放电过程中带电粒子的运动轨迹

同时充分考虑了电子与SF

分子及N

分子的各种电离碰撞过程以及复合过程。仿真结果表明:放电过程中

电子主要与SF

分子发生电离碰撞过程以及复合过程。放电过程初始阶段

空间电子数呈现出上下波动的规律

当t≥20 ns时

空间电子数将迅速减少直至完全复合。此外

在整个放电过程中

正离子分布范围始终大于负离子分布范围。PIC/MCC仿真模拟从纯微观角度展现了SF

混合气体放电过程

对研究SF

混合气体放电过程具有重要意义。

Abstract

In order to study the discharge process of a cylindrical insulator placed in SF

gas mixture

a method that combines the particle-in-cell method（PIC method） and Monte Carlo collision model（MCC model） has been developed to model the trajectories of charged particles during a discharge process with consideration of the collisional ionization and recombination processes between electrons and SF

molecules. Results show that the main ionization and recombination processes are those between electrons and SF

molecules. At the initial stage of the discharge process

the number of electrons exhibits regular fluctuation. After 20 ns

the electron number decreases quickly until complete recombination. In addition

the space over which positive ions distribute is always larger than that for the negative ions in the whole discharge process. The PIC/MCC model illustrates the discharge process of SF

mixture at microscopic level and has significant implication for the study of SF

mixture discharge process.

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PIC/MCC Simulation of Gas Discharge Process in SF6/N2 Gas Mixture

DOI：10.13296/j.1001-1609.hva.2016.12.026

摘要

Abstract

关键词

Keywords

references

PIC/MCC Simulation of Gas Discharge Process in SF₆/N₂ Gas Mixture