GAO Qiangyuan, ZHANG Jianhong, ZHENG Xueqin, et al. Study on Partial Discharge of Metal Defects in 110kV Basin-type Insulator Flange[J]. High voltageapparatus, 2018, 54(1): 219-223+229.
GAO Qiangyuan, ZHANG Jianhong, ZHENG Xueqin, et al. Study on Partial Discharge of Metal Defects in 110kV Basin-type Insulator Flange[J]. High voltageapparatus, 2018, 54(1): 219-223+229. DOI: 10.13296/j.1001-1609.hva.2018.01.033.
Study on Partial Discharge of Metal Defects in 110kV Basin-type Insulator Flange
The paper aims at the non-stable partial discharge of the existing metal flange and the basin-typeinsulator without using full shielding inner rings. The paper confirms the cause of this phenomenon is the gapbetween basin-type insulator and the metal flange distributes unevenly. In order to solve the finding problems
thepaper adjusts the uniformities of the air gap and uses full-shielding inner rings. The tests proved that these twosolutions are effective and feasible.