REN Limiao, MA Jianqiao, XU Jinyang, et al. Influence of Fitting Structure on Local Electric Field Intensity Around Pantograph Supporting Insulators of Electric Multiple Units[J]. High voltageapparatus, 2019, 55(8): 212-217.
REN Limiao, MA Jianqiao, XU Jinyang, et al. Influence of Fitting Structure on Local Electric Field Intensity Around Pantograph Supporting Insulators of Electric Multiple Units[J]. High voltageapparatus, 2019, 55(8): 212-217. DOI: 10.13296/j.1001-1609.hva.2019.08.030.
Influence of Fitting Structure on Local Electric Field Intensity Around Pantograph Supporting Insulators of Electric Multiple Units
The metal fitting structure on high voltage side of the EMU(electric multiple units)roof pantograph post insulator affects the distribution uniformity of the electric field intensity on the insulator surface
and the uneven electric field may lead to the increase of the flashover frequency on the insulator.In this study
the software Solidworks and the electrostatic field module of finite element software are employed to simulate and analyze the influences of the metal fitting structure on the air domain near the insulator
as well as the surface potential and electric field distribution on the insulator
on the basis of the electrostatic field theory.The structure of the fitting is optimized and the effect is verified by experiments.The results show that the electric field intensity distribution at the fitting joint on high voltage side is uneven under the existing connection mode
and the optimized connecting fittings can effectively reduce the local potential gradient to decrease the frequency of flashover faults.This study may provide a reference for structural optimization design and experimental verification of pantograph insulators in EMU.