CHEN Zhonghua, WANG Yifan, YANG Caihong, et al. Study on Dynamic Contact Resistance of Pantograph Catenary Under Fluctuating Load[J]. High voltageapparatus, 2019, 55(10): 148-155+163.
CHEN Zhonghua, WANG Yifan, YANG Caihong, et al. Study on Dynamic Contact Resistance of Pantograph Catenary Under Fluctuating Load[J]. High voltageapparatus, 2019, 55(10): 148-155+163. DOI: 10.13296/j.1001-1609.hva.2019.10.025.
Study on Dynamic Contact Resistance of Pantograph Catenary Under Fluctuating Load
and the fluctuating load has an important influence on contact resistance characteristics in pantograph catenary system.In this paper
the pressure fluctuation in the pantograph catenary system is simulated by a pin disk high speed current borne friction and wear tester
the influence of different factors on the dynamic contact resistance is studied and combining with the surface morphology
the causes of its variation regulation are analyzed. The experimental results show that when the current carrying sliding contact and pressure fluctuation frequency are definitized
the dynamic contact resistance decreases first and then increases with the increase of pressure fluctuation range; when the pressure fluctuation range is definitized
the dynamic contact resistance increases slowly with the increase of pressure fluctuation frequency. Under the condition of fluctuating load
dynamic contact resistance increases with the increase of sliding velocity
decreases with the increase of contact current.High temperature arc and contact temperature rise are the main causes of dynamic contact resistance change.