LIN Xin, ZHONG Jianying, WANG Qiang, et al. Study on Adsorption Characteristics of Gas Insulation Medium C4F7N on Al(110) Surface[J]. High voltageapparatus, 2021, 57(3): 83-88.
LIN Xin, ZHONG Jianying, WANG Qiang, et al. Study on Adsorption Characteristics of Gas Insulation Medium C4F7N on Al(110) Surface[J]. High voltageapparatus, 2021, 57(3): 83-88. DOI: 10.13296/j.1001-1609.hva.2021.03.014.
Study on Adsorption Characteristics of Gas Insulation Medium C4F7N on Al(110) Surface
is superior in the aspect of electrical strength and environmental pro-tection.However
the study on the compatibility of C
4
F
7
N gas with materials is relatively rare.Aluminum(A1)
akind of metallic material
is widely used in gas-insulated equipment.Therefore
simulation study on the adsorptionof C
4
F
7
N molecules on the surface of Al(110)is performed on the basis of density functional theory.Firstly
the sur-face structure of C
4
F
7
N and Al(110)is calculated and analyzed and initial structure of C
4
F
7
N adsorbed on Al(110)surface is discussed.Secondly
the initial structure is simulated and calculated.The absorption process of C
4
F
7
N onAl(110)surface is analyzed by way of calculating adsorption energy
transfer charge
differential charge densityand state density during the adsorption process so to explore the interaction mechanism between C
4
F
7
N and Al(110)surface.It is shown by the study that the CN group of C
4
F
7
N molecule has strong reactivity and is easily adsorbed ontop and long bridge positions of the Al(110)surface.Hybridization occurs between the s and p orbitals of N and C at-oms in the CN group and the s and p orbitals of Al atoms on the surface of Al(110)