Study on the Discharge Decomposition Mechanism of Environmentally-friendly Medium HFO-1336mzz（E）

DING Minxuan; LIN Xin; CUI Zhaoxuan; XU Jianyuan

doi:10.13296/j.1001-1609.hva.2026.07.018

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Study on the Discharge Decomposition Mechanism of Environmentally-friendly Medium HFO-1336mzz（E）

Research & Analysis | 更新时间：2026-07-06

- Study on the Discharge Decomposition Mechanism of Environmentally-friendly Medium HFO-1336mzz（E）
- High Voltage Apparatus Vol. 62, Issue 7, Pages: 175-181(2026)
- 作者机构：
  
  沈阳工业大学电气工程学院，沈阳 110870
- 作者简介：
- 基金信息：
- DOI：10.13296/j.1001-1609.hva.2026.07.018
  CLC：
- Received：14 January 2026，
  
  Revised：2026-03-18，
  
  Published：16 July 2026
- 稿件说明：
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DING Minxuan, LIN Xin, CUI Zhaoxuan, et al. Study on the Discharge Decomposition Mechanism of Environmentally-friendly Medium HFO-1336mzz（E）[J]. High Voltage Apparatus, 2026, 62(7): 175-181.
DOI：

DING Minxuan, LIN Xin, CUI Zhaoxuan, et al. Study on the Discharge Decomposition Mechanism of Environmentally-friendly Medium HFO-1336mzz（E）[J]. High Voltage Apparatus, 2026, 62(7): 175-181. DOI： 10.13296/j.1001-1609.hva.2026.07.018.

摘要

HFO-1336mzz（E）作为一种新型环保绝缘介质，具有一定的绝缘能力，是目前具有应用潜力的SF

替代气体之一，但对其分解特性的研究尚少。文中基于DFT密度泛函理论，计算其解离前后的反应能量变化，获得其分解、复合路径、放电分解产物；采用变分过渡态理论，获得300～1 500 K温度下其分解反应的反应速率常数；计算放电分解产物的电离能、分子轨道能隙值等参数，并与HFO-1336mzz（E）气体进行对比。研究表明HFO-1336mzz（E）气体的分子轨道能隙值及电负性略低于SF

；分子中C-H键断裂反应所需的能量注入最低，且其在300～1 500 K温度下的初步解离反应中反应速率最高，在初步解离过程中占主导地位，是放电故障工况下导致绝缘气体分子消耗的主要因素。生成的多种氟碳类产物的电离能较高，具有较好的耐电强度，其耐电强度和结构稳定性接近于HFO-1336mzz（E），故推测气体分解后的产物仍具有较好的绝缘性能。文中的研究结果可进一步地为替代气体的分解特性的研究奠定理论基础。

Abstract

HFO-1336mzz（E）

as a new type of environmentally friendly insulation medium

has a certain insulation ability

and is presently one of the potential alternative gases to SF

gas. However

the study of its decomposition charcateristics is less. Based on density functional theory（DFT）

in this paper the reaction energy changes before and after dissociation is calculated

the decomposition

recombination pathways and dicharge decomposition product are obtained.Using the variational transition state theory

the reaction rate constants for the decomposition reaction at temperatures ranging from 300 K to 1500 K are derived. Such parameters as ionization energy and molecular orbital energy gap of the decomposition products were calculated and compared with those of HFO-1336mzz（E）gas. The study shows that the molecular orbital energy gap and electronegativity of HFO-1336mzz（E）gas are slightly lower than those of SF

. The energy injection required for the C-H bond fracture reaction is the lowest

among the molecules

and its reaction rate is the highest in the initial dissociation reaction at the temperature of 300～1500 K， which dominates the early decomposition proces and is the primary factor responsible for the consumption of the insulating gas molecules under discharge fault conditions. The generated fluorohydrocarbon products have high ionization energy

good electrical resistance

and their electrical resistance strength as well as structural stability are close to HFO-1336mzz（E）.It is therefore speculated that the products after gas decomposition still have good insulation performance. The study results in this paper can further lay a theoretical foundation for the evaluation and research of the decomposition character of HFO-1336mzz（E）gas.

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